Modeling the Ion Implantation Treatment of Materials from Pulse Laser Plasma

Modeling the pulse laser plasma scattering under the intensive external electric field, used for the ion acceleration in the implantation treatment of materials, is conducted by the method "Particles in Cells". Dynamics of ion and electron components is studied as well as peculiarities of distribution of the potential when negative high-voltage pulses of various forms are applied to the treated blank. Current and dose characteristics, computed and experimentally measured, of the ion beam being formed are compared. The feasibility of using the developed model for optimization of requirements to technological parameters and equipment is shown.